Washroom designer and manufacturer, Washroom Washroom, has launched a new WC cubicle, manufactured using the latest nanotechnology for a high-performance, design-led finish.
The new Alto FENIX WC cubicle from Washroom, which is based on its already-popular Alto range of full-height cubicles, has been designed to provide a unique super-matt surface, while the rebated edges which characterise the Alto range, create an attractive, virtually-seamless façade for the ultimate design statement.
Available in 15 colours and designed specifically for projects demanding exacting aesthetic and performance standards, Alto FENIX is manufactured from Fenix NTM, which is made in Italy by Arpa Industriale, using the latest nanotechnology to create a highly-durable, tough acrylic resin surface.
Thermally self-healing and hydro repellent, as well as being impact and scratch resistant, Fenix NTM, which also has enhanced anti-bacterial properties and is easy to clean, is ideal for washrooms and changing areas where a luxury, high-performance finish is required.
Trevor Bowers, director at Washroom Washroom, said: “Clients are increasingly looking for something a bit different to create a unique washroom space, which is what drove us to create our Iconica Collection and means we’re always on the look-out for new materials like Fenix NTM to incorporate into our product offering.
“Our Alto range remains one of our most-popular WC cubicles and we’re delighted with new Alto FENIX cubicle which not only provides the fashionable matt surface clients are looking for, but also benefits from the perfect balance of aesthetics and practicality. We’re extremely proud of our Iconica Collection and are determined to continue to drive bespoke design and celebrate extraordinary washroom design.”
Alto FENIX is the latest addition to Washroom’s exclusive Iconica Collection, which comprises a range of bespoke, high-specification designs, materials and finishes which are not traditionally associated with washrooms to create unique washroom design solutions.